Online ISSN: 1884-4111 Print ISSN: 0033-8303
Radioisotopes 66(11): 557-566 (2017)

特集Special Issues

21 化学増幅ポジ型電子線レジストの材料設計指針21 Material Design of the Chemically Amplified Positive Type Electron Beam Resist

大阪市立大学大学院工学研究科化学生物系専攻Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University ◇ 558–8585 大阪市住吉区杉本3–3–138 ◇ 3–3–138 Sugimoto, Sumiyoshi-ku, Osaka 558–8585, Japan

発行日:2017年11月15日Published: November 15, 2017


The dissolution characteristics of a chemically amplified electron beam (EB) resist composed of partially tert-butoxycarbonyl group (tBOC) protected poly(p-vinylphenol)(PVP), a dissolution inhibitor, and an acid generator were investigated. The resist sensitivity was improved with decreasing tBOC ratio of the matrix resin. As the tBOC ratio increased, the resolution of the resist was better. SEM observation of the pattern profile was carried out to investigate the sensitivity and the resolution of the resist. The optimum tBOC ratio was 23.8%. As dissolution inhibitors, hydroquinone protected by a tert-butoxycarbonyl group(B-HQ) and isophthalic acid protected by a tert-butyl group(B-IP) are used. Dissolution inhibitors (B-HQ and B-IP) become dissolution promoters (HQ and IP) after exposure. The dissolution rate of the resist consisting of B-IP was faster than that of B-HQ in the exposed area. Pka of IP is smaller than that of HQ, and the acidity of IP is higher than that of HQ. Therefore IP enhances the solubility of the matrix resin in the alkaline developer. We evaluated the dependence of sensitivity of the resist upon acid generators. Triphenylsulfonium triflate, Diphenyliodonium triflate, Triphenylsulfonium antimonate, and Diphenyliodonium antimonate were used. When iodonium ion was used as cation, the sensitivity of the resist was better. When antimonate ion as anion was used, the sensitivity of the resist was better.

Key words: chemically amplified resist; electron beam; resist sensitivity; resist resolution; dissolution promoter; acid generator

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